Agglomeration of Nano Diamond Particles

Nano-scale diamond particles naturally possess high surface energy and may form agglomerates if dispersion is not properly controlled.

Particle agglomeration can negatively affect polishing consistency and may increase the risk of surface defects during precision polishing operations.

Particle Settling During Storage

Diamond particles have significantly higher density than carrier liquids.

Without proper suspension systems, abrasive particles may gradually settle during storage, potentially affecting slurry consistency and process stability.

Inconsistent Surface Finishing

Variations in particle size distribution can influence material removal behavior and polishing consistency.

How Our Slurry Formulation Addresses These Challenges

The slurry system is designed to support:

• Stable particle dispersion
• Controlled particle size distribution
• Reduced agglomeration tendency
• Improved suspension stability
• Consistent polishing performance

Actual performance depends on storage conditions, application methods, polishing equipment, and process parameters.

Applications of More Nano diamond slurry

Optical Polishing

Suitable for precision polishing of optical glass, optical crystals, and photonic components.

Metallographic Sample Preparation

Suitable for final polishing of metallographic specimens and material analysis samples.

Semiconductor Processing

Used in wafer polishing and precision surface finishing applications.

Sapphire Polishing

For sapphire wafers and optical sapphire components.

Advanced Ceramics

Suitable for polishing alumina, zirconia, silicon carbide and other engineering ceramics.

Precision Metal Polishing

For mold components, carbide tooling and precision mechanical parts.