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Your Position: Home > Abrasives & Consumables > Polishing Pad > PU Polishing Pad

PU Polishing Pad

Polyurethane Polishing Pad, CMP polyurethane pad

Abrasive: Cerium Oxide and Zirconium Oxide, some pads none filler

Model: , MSH-13, MSH- 26,MSH-46,MSH- 57,MSH-66,MSH-77,MSH-LAERS

Thickness: 0.02″ (0.508 mm) – 0.20″ (5.08 mm)

CMP Polishing Pad for polsihing flat glass, LCD/LED substrates, precision optics components, hard disk, metal, wafer...

Grooved and without groove PU Polishing Pad

material

Diameter [mm]

23" x 55"

36" x 71"

42"x 42"

52"x 52"

abrasive

cerium oxide

zirconium oxide

none filler abrasive

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High quality polyurethane polishing pad designed for advanced CMP polishing processes in semiconductor wafers,LCD/LED substrates,hard disk,optical glass and display panels.

CMP Polishing pad refers to a pad featuring a microporous structure, primarily manufactured using a polyurethane foaming process.

Processing Materials: Semiconductor Substrates/Wafers, Precision Optical Components,LCD/Flat Panel Displays,, Disk Storage Substrates, Disk Drive Heads, and Sapphire.

Minimum thickness of grooved polishing pad: 1 mm

Standard groove depth: 1/2 of the polishing pad thickness.

Custom grooved PU pad service

Shape: Rectangle, Square,Round

Advantages of PU polishing pad

Moresuperhard as CMP pad supplier, can produce PU polishing pad grooved in various patterns to facilitate the flow of polishing fluid, carry away abrasive debris, and enhance heat dissipation.

Thicknesses ranging from 0.02" to 0.2"can be produced, with a maximum achievable thickness of 1 inch; other thicknesses can also be customized to suit various applications.

Facing polishing challenges

CMP polishing pad is engineered to solve common polishing challenges, such as:

Scratches during CMP processing
Rapid pad wear
Non-uniform polishing results

With optimized micro-porous polyurethane structure and customizable groove design, our custom grooved PU pad ensures stable polishing performance in both small batch and high-volume production environments.

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Model Overview

Model	Filler	Average Density G / cm³ (Ib / ft³ ）	Average Hardness shore – A	Application Area
MSH- 13	cerium oxide	0.35 (22)	66	Glass Crystal	Get a quote
MSH- 26	zirconium oxide	0.57(36)	88	Glass Crystal	Get a quote
MSH-46	zirconium oxide	0.40 (25)	74	Glass Crystal	Get a quote
MSH- 57	none	0.51 (32)	88	Glass Metal Ceramic Crystal	Get a quote
MSH- 66	cerium oxide	0.42 (26)	78	Glass Crystal Metal Ceramic	Get a quote
MSH- 77	cerium oxide	0.43 (27)	78	Glass Crystal	Get a quote
MSH- 87	none	0.77 (49)	96	Glass Metal Ceramic Crystal	Get a quote
MSH- LASER	zirconium oxide	0.59 (37)	90	Glass Metal Ceramic	Get a quote

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