Traditional polishing fluids often struggle with unstable performance, leading to surface haze, inconsistent removal rates, and sub-surface damage left after grinding.
Our Polycrystalline Diamond Slurry is engineered to solve these issues with controlled particle morphology and stable dispersion chemistry.
Polycrystalline Diamond Slurry is widely used in sapphire polishing slurry processes and advanced semiconductor wafer finishing where ultra-smooth surface quality is required. It also performs effectively in SiC lapping slurry applications, especially for hard and brittle materials requiring controlled material removal.
Applications of Polycrystalline Diamond Slurry in Precision Material Processing
- Sapphire wafer polishing
- SiC substrate lapping slurry process
- Optical glass finishing
- Ceramic components polishing
- Semiconductor material planarization
- Precision mold & hard alloy finishing
Common Industry Problems
- Sub-surface damage remains after coarse grinding
- Glass surface develops haze after polishing
- Unstable slurry pH causes micro corrosion
- Low removal efficiency increases process time
Our Solution
- High-efficiency poly diamond slurry removes SSD layer effectively
- Produces clear, haze-free optical surfaces
- Stable chemical system prevents surface corrosion
- Faster polishing with improved throughput